The target areas of intervention of the NUS Centre for Advanced 2D Materials are:

  • Atomically thin, wafer size, crystal growth, and characterization: Raman, AFM, TEM, STM, magneto transport, angle resolved photoemission (ARPES), optics.
  • Flexible electronics and strain engineering of atomically thin materials.
  • Mechanics of atomically thin film transfer.
  • Nano-scale patterning and new device development.
  • Three-dimensional architectures based on atomically thin films (atomic multi-layers, see figure).
  • Composite materials where accumulated stress could be monitored by contactless, non-invasive, optical methods.
  • Spintronics and valleytronics in two-dimensional materials.
  • Atomically thin electrodes for photovoltaic or OLED applications.
  • Atomically thin gas barriers and electrodes for energy/charge transfer and storage (water splitting, fuel cells, etc).
  • Solution-processed atomically thin substrates for bio applications and catalysis.
  • Atomically thin films as optical components in fiber lasers (mode locking, polarizers etc).
  • Atomically thin film platforms for bio-sensing and stem cell growth.
  • Atomically thin film platforms for sol-gel, organic, and electro-chemistry.
  • Graphene-ferroelectric memories (G-FeRAM), graphene spin torque transistors (G-STT).
  • Computational modeling of new atomically thin materials and complex architectures.