@article{ISI:001360396900001,
title = {Nb impurity-bound excitons as quantum emitters in monolayer WS_{2}},
author = {Leyi Loh and Yi Wei Ho and Fengyuan Xuan and Andres Granados del Aguila and Yuan Chen and See Yoong Wong and Jingda Zhang and Zhe Wang and Kenji Watanabe and Takashi Taniguchi and Paul J Pigram and Michel Bosman and Su Ying Quek and Maciej Koperski and Goki Eda},
doi = {10.1038/s41467-024-54360-5},
times_cited = {0},
year = {2024},
date = {2024-11-20},
journal = {NATURE COMMUNICATIONS},
volume = {15},
number = {1},
publisher = {NATURE PORTFOLIO},
address = {HEIDELBERGER PLATZ 3, BERLIN, 14197, GERMANY},
abstract = {Point defects in crystalline solids behave as optically addressable individual quantum systems when present in sufficiently low concentrations. In two-dimensional (2D) semiconductors, such quantum defects hold potential as versatile single photon sources. Here, we report the synthesis and optical properties of Nb-doped monolayer WS2 in the dilute limit where the average spacing between individual dopants exceeds the optical diffraction limit, allowing the emission spectrum to be studied at the single-dopant level. We show that these individual dopants exhibit common features of quantum emitters, including narrow emission lines (with linewidths <1 meV), strong spatial confinement, and photon antibunching. These emitters consistently occur within a narrow spectral range across multiple samples, distinct from common quantum emitters in van der Waals (vdW) materials that show large ensemble broadening. Analysis of the Zeeman splitting reveals that they can be attributed to bound exciton complexes comprising dark excitons and negatively charged Nb.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}

@article{ISI:001357050400001,
title = {Digital Etching of Molybdenum Interconnects Using Plasma Oxidation},
author = {Ivan Erofeev and Antony Winata Hartanto and Muhaimin Mareum Khan and Kerong Deng and Krishna Kumar and Zainul Aabdin and Weng Weei Tjiu and Mingsheng Zhang and Antoine Pacco and Harold Philipsen and Angshuman Ray Chowdhuri and Han Vinh Huynh and Frank Holsteyns and Utkur Mirsaidov},
doi = {10.1002/admi.202400558},
times_cited = {0},
issn = {2196-7350},
year = {2024},
date = {2024-11-12},
journal = {ADVANCED MATERIALS INTERFACES},
publisher = {WILEY},
address = {111 RIVER ST, HOBOKEN 07030-5774, NJ USA},
abstract = {Molybdenum (Mo) has a high potential of becoming the material of choice for sub-10 nm scale metal structures in future integrated circuits (ICs). Manufacturing at this scale requires exceptional precision and consistency, so many metal processing techniques must be reconsidered. In particular, present direct wet chemical etching methods produce anisotropic etching profiles with significant surface roughness, which can be detrimental to device performance. Here, it is shown that polycrystalline Mo nanowires can be etched uniformly using a cyclic two-step "digital" method: the metal surface is first oxidized with isotropic oxygen plasma to form a layer of MoO3, which is then selectively removed using either wet chemical or dry isotropic plasma etching. These two steps are repeated in cycles until the intended metal recess is achieved. High uniformity of plasma oxidation defines the etching uniformity, and small metal recess per cycle (typically 1-2 nm) provides precise control over the etching depth. This method can replace wet etching where high etching precision is needed, enabling the reliable manufacturing of nanoscale metal interconnects.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}

@article{ISI:001357180100001,
title = {Enhanced Self-Healing in Dual Network Entangled Hydrogels by Macromolecular Architecture and Alignent of Surface Functionalized hBN Nanosheets},
author = {Chirag R Ratwani and Katarzyna Z Donato and Sergey Grebenchuk and Alice Mija and Kostya S Novoselov and Amr M Abdelkader},
doi = {10.1002/admi.202400691},
times_cited = {0},
issn = {2196-7350},
year = {2024},
date = {2024-10-31},
journal = {ADVANCED MATERIALS INTERFACES},
publisher = {WILEY},
address = {111 RIVER ST, HOBOKEN 07030-5774, NJ USA},
abstract = {Hydrogels have shown great promise as versatile biomaterials for various applications, ranging from tissue engineering to flexible electronics. Among their notable attributes, self-healing capabilities stand out as a significant advantage, facilitating autonomous repair of mechanical damage and restoration of structural integrity. In this work, a dual network macromolecular biphasic composite is designed using an anisotropic structure which facilitates unidirectional chain diffusion and imparts superior self-healing and mechanical properties. The resulting nanocomposite demonstrates significantly higher self-healing efficiency (92%) compared to traditional polyvinyl alcohol (PVA) hydrogels, while also improving the tensile strength and elastic modulus, which typically compete with each other in soft materials. This improvement is attributed to enhanced barrier properties within the matrix due to the alignment of surface-functionalized 2D hBN nanosheets along the biopolymer scaffold. The insights gained from this research can be leveraged to develop advanced self-healing materials by using 2D nanofillers as "safety barriers" to define the movement of polymeric chains.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}

@article{ISI:001345125600001,
title = {Recent Progress of Imaging Chemical Bonds by Scanning Probe Microscopy: A Review},
author = {Dingguan Wang and Tobias Haposan and Jinwei Fan and Arramel and Andrew T S Wee},
doi = {10.1021/acsnano.4c10522},
times_cited = {0},
issn = {1936-0851},
year = {2024},
date = {2024-10-30},
journal = {ACS NANO},
volume = {18},
number = {45},
pages = {30919-30942},
publisher = {AMER CHEMICAL SOC},
address = {1155 16TH ST, NW, WASHINGTON, DC 20036 USA},
abstract = {In the past decades, the invention of scanning probe microscopy (SPM) as the versatile surface-based characterization of organic molecules has triggered significant interest throughout multidisciplinary fields. In particular, the bond-resolved imaging acquired by SPM techniques has extended its fundamental function of not only unraveling the chemical structure but also allowing us to resolve the structure-property relationship. Here, we present a systematical review on the history of chemical bonds imaged by means of noncontact atomic force microscopy (nc-AFM) and bond-resolved scanning tunneling microscopy (BR-STM) techniques. We first summarize the advancement of real-space imaging of covalent bonds and the investigation of intermolecular noncovalent bonds. Beyond the bond imaging, we also highlight the applications of the bond-resolved SPM techniques such as on-surface synthesis, the determination of the reaction pathway, the identification of molecular configurations and unknown products, and the generation of artificial molecules created via tip manipulation. Lastly, we discuss the current status of SPM techniques and highlight several key technical challenges that must be solved in the coming years. In comparison to the existing reviews, this work invokes researchers from surface science, chemistry, condensed matter physics, and theoretical physics to uncover the bond-resolved SPM technique as an emerging tool in exploiting the molecule/surface system and their future applications.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}

@article{ISI:001337998600001,
title = {Nanoscale Wet Etching of Molybdenum Interconnects with Organic Solutions},
author = {Kerong Deng and Ivan Erofeev and Angshuman Ray Chowdhuri and Harold Philipsen and Zainul Aabdin and Antony Winata Hartanto and Weng Weei Tjiu and Mingsheng Zhang and Devshan Fernando and Khakimjon Saidov and Krishna Kumar and Antoine Pacco and Frank Holsteyns and Han Vinh Huynh and Utkur Mirsaidov},
doi = {10.1002/smll.202406713},
times_cited = {0},
issn = {1613-6810},
year = {2024},
date = {2024-10-22},
journal = {SMALL},
publisher = {WILEY-V C H VERLAG GMBH},
address = {POSTFACH 101161, 69451 WEINHEIM, GERMANY},
abstract = {Molybdenum (Mo) has emerged as a promising material for advanced semiconductor devices, especially in the design and fabrication of interconnects requiring sub-10 nm metal nanostructures. However, current wet etching methods for Mo using aqueous solutions struggle to achieve smooth etching profiles at such scales. To address this problem, we explore wet chemical etching of patterned Mo nanowires (NWs) using an organic solution: ceric ammonium nitrate (CAN) dissolved in acetonitrile (ACN). In this study, we demonstrate two distinct etching pathways by controlling the reaction temperature: i) digital cyclic scheme at room temperature, with a self-limiting Mo recess per cycle of approximate to 1.6 nm, and ii) direct etching at elevated temperature (60 degrees C), with a time-controlled Mo recess of approximate to 2 nm min-1. These methods not only offer a highly controllable nanoscale Mo etching but also ensure smooth and uniform etching profiles independent of the crystal grain orientation of the metal.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}